Intel Unveils EUV Micro-Exposure Tool

KingFishKingFish
edited August 2004 in Science & Tech
Intel Corp. said Monday (Aug. 2) it has installed an extreme ultraviolet (EUV) micro-exposure tool from Exitech Ltd. at its development fab in Oregon.
Using the 13.5-nm EUV light, the tool is capable of exposing 30-nm isolated lines, and Intel will use it to prove out the EUV photoresists and masks. Intel plans to use the EUV approach at the 32-nm node, which goes into volume manufacturing in 2009. The installation of the tool at the company's RP1 (research and pathfinding) fab brings EUV to what Intel calls the "path-finding" stage prior to high-volume manufacturing, said Sunlin Chou, Intel's senior vice president in charge of manufacturing and technology.
Source: EE Times
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