Japanese firm makes 45 nano litho breakthrough
mmonnin
Centreville, VA
http://www.theinquirer.net/?article=11085
"ONE OF THE PROBLEMS all semiconductor manufacturers face is that as the line width on chips gets to the sub 65 nanometer level, conventional photography techniques just won't do the job."
"This, it explains, is a next gen stepper system using a fluorine laser as the light source and that will be able to create 45 nanometer circuit lines on semiconductors."
"ONE OF THE PROBLEMS all semiconductor manufacturers face is that as the line width on chips gets to the sub 65 nanometer level, conventional photography techniques just won't do the job."
"This, it explains, is a next gen stepper system using a fluorine laser as the light source and that will be able to create 45 nanometer circuit lines on semiconductors."
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